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钼基体上真空等离子体喷涂钨涂层的研究
引用本文:邝子奇,代明江,熊国刚,刘敏,邓畅光,周克崧. 钼基体上真空等离子体喷涂钨涂层的研究[J]. 真空科学与技术学报, 2005, 25(5): 381-384
作者姓名:邝子奇  代明江  熊国刚  刘敏  邓畅光  周克崧
作者单位:1. 广州有色金属研究院,广州,510651
2. 中国工程物理研究院机械制造工艺研究所,绵阳,621900
摘    要:采用真空等离子体喷涂(VPS)技术制备出厚度超过0.8 mm的金属钨涂层,并对涂层进行了高温热处理.结果显示:金属钨涂层主要呈层状结构,其密度可达到理论密度的98%以上;工艺参数对喷涂涂层性能有较大影响,特别是对涂层密度、结合强度有影响;高温热处理引起界面结构变化,形成钨钼混合层,且再结晶形成细小的晶粒;和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比,低压等离子体喷涂具有明显的优势.

关 键 词:真空等离子体喷涂  钨涂层  高温热处理  钼基体
文章编号:1672-7126(2005)05-0381-04
收稿时间:2004-12-30
修稿时间:2004-12-30

Tungsten Coating on Mo Substrate by Vacuum Plasma Spray
Kuang Ziqi,Dai Mingjiang,Xiong Guogang,Liu Min,Deng Changguang,Zhou Kesong. Tungsten Coating on Mo Substrate by Vacuum Plasma Spray[J]. JOurnal of Vacuum Science and Technology, 2005, 25(5): 381-384
Authors:Kuang Ziqi  Dai Mingjiang  Xiong Guogang  Liu Min  Deng Changguang  Zhou Kesong
Affiliation:1. Guangzhou Research Institute of Non-ferrous Metals, Guangzhou,510651, China ; 2. Mechanic Manufacture Process Institute of China Academic Engineering Physics,Mianyang,621900, China
Abstract:Thick tungsten films were coated on molybdenum substrate by vacuum plasma spray and annealed in-situ at different high temperatures.The W coatings were characterized with X-ray diffraction(XRD) and scanning electron microscopy(SEM).The results show that the W coating has a compact,layered structure with a density close to 98% of the theoretical prediction.We found coating conditions strongly affect its properties,such as its grain size,its compactness and its interfacial adhesion.For instance,high annealing temperature results in formation of fine grains and inter-diffusion at the W/Mo interface.The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.
Keywords:Vacuum plasma spray   W coating   High temperature treatment   Mo substrate
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