Negative ion production rates in rare gas-halide lasers |
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Authors: | Nygaard K. Brooks H. Hunter S. |
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Affiliation: | University of Missouri-Rolla, Rolla, MO, USA; |
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Abstract: | This paper reports on dissociative electron attachment in F2, NF3, Cl2, and I2. The principle of the method is to produce a short burst of photoelectrons from a photocathode by means of light from an argon-fluoride laser. Subsequently, by studying the motion of electrons and negative ions in a constant electric field (E) region, information is obtained about drift velocities and effective attachment cross sections. Helium, argon, and nitrogen were used as buffer gases. Of particular interest is a very strong temperature dependence of the attachment coefficient in I2. Measurements were taken from 35 to 110°C, covering anE/Nrange of 1-50 Townsend. An explanation based on vibrational excitation is presented. |
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