Laser-ablated plasma for deposition of ZnO thin films on various substrates |
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| Authors: | T. Ohshima R.K. Thareja Y. Yamagata T. Ikegami K. Ebihara J. Narayan |
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| Affiliation: | 1. Graduate School of Science and Technology, Kumamoto University, 2-39-1 Kurokami, Kumamoto, 860-8555, Japantamiko@st.eecs.kumamoto-u.ac.jp;3. Department of Electrical and Computer Engineering, Kumamoto University, 2-39-1 Kurokami, Kumamoto, 860-0862, Japan;4. Graduate School of Science and Technology, Kumamoto University, 2-39-1 Kurokami, Kumamoto, 860-8555, Japan;5. Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7916, USA |
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| Abstract: | We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on 1100) n-typesilicon and quartz substrates at various pressures of back ground gas. ZnO plasma was created using KrF laser 1248 nm) atvarious pressures of the ambient gas, oxygen. Laser induced plasma at varying fluence on the target was investigated using optical emission spectroscopy and 2-D images of the expanding plumes. X-ray diffraction, atomic force microscopy, and spectro-photometry were used to characterize as grown films. |
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| Keywords: | ZnO Pulsed laser deposition Laser-ablated plasma Thin film Spectroscopy |
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