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The dependence of hydrofluoric acid concentration during anodization on photoluminescence of porous silicon |
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| Authors: | Masato Ohmukai Yoshinori Nishiguchi Yasuo Tsutsumi |
| Affiliation: | 1. ohmukai@akashi.ac.jp;3. Department of Electrical Engineering, Akashi College of Technology, 679-3 Nishioka, Uozumi, Akashi, Hyogo, 674-8501, Japan |
| Abstract: | The mixture of hydrofluoric (HF) acid and ethanol is used as an electrolyte during anodization of silicon. We investigated the effect of the ratio of HF acid to ethanol on photoluminescence. It is concluded that porous silicon anodized with the electrolyte containing 35 or 40% HF acid provides strong photoluminescence. The fact implies the existence of a chemical reaction including ethanol during anodization other than electrochemical reaction. |
| Keywords: | Porous silicon photoluminescence Hydrofluoric concentration Chemical reaction |