Nanofabrication of magnetic tunnel junctions by using side-edge thin film deposition |
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Authors: | T. Niizeki H. Kubota Y. Ando T. Miyazaki |
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Affiliation: | 1. tom@mlab.apph.tohoku.ac.jp;3. Graduate School of EngineeringTohoku University,, Aoba-yama05 Sendai 980-8579 Japan |
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Abstract: | Nanostructured double ferromagnetic tunnel junctions (MTJs) are indispensable for investigation of spin-dependent single-electron transport at low temperature. A new fabrication process that enables us to reduce the size of MTJs down to nanometer scale by using the side edge of a patterned film were developed. The multilayers of MTJ partially replaced by thick Al2O3/Cu double layer were prepared by using electron beam lithography and lift-off, then Pt film was vacuum-evaporated onto the side edge of Al2O3/Cu film, which masked MTJ during following Ar ion milling. As a result, the double MTJs with the dimension of 10 nm £ 10 mm were formed beneath the Pt film. The large tunnel magnetoresistive ratio of 35% and symmetrical I–V characteristics were obtained at room temperature. |
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Keywords: | Tunnel magnetoresistance Single-electron tunneling Magnetic tunnel junction Nanostructure |
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