Evolution and properties of adherent diamond films with ultra high nucleation density deposited onto alumina |
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| Affiliation: | 1. Microgravity Research Center, Université libre de Bruxelles, Brussels, Belgium;2. Novosibirsk State University, Novosibirsk, Russian Federation;3. Universita degli Studi di Napoli Federico II, Napoli, Italy;1. Gemological institute of America, New York, NY 10036, USA;2. Geodynamics Research Center, Ehime University, 2-5 Bunkyo-cho, Matsuyama 790-8577, Japan;4. School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510641, China;1. University of Bordeaux, Bordeaux Institute of Technology, IMS Laboratory, CNRS UMR 5218, F-33400 Talence, France;2. LAAS — CNRS, 7 avenue du colonel Roche, F-31400 Toulouse, France;3. Univ de Toulouse, LAAS, F-31400 Toulouse, France;4. Univ de Toulouse, UPS, LAAS, F-31400 Toulouse, France;5. Université de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma Conversion d''Energie), 118 route de Narbonne, F-31062 Toulouse cedex 9, France;6. CNRS, LAPLACE, F-31062 Toulouse, France;7. Université de Lyon, CNRS, Laboratoire AMPERE, UMR 5005, INSA de Lyon, F-69621 Villeurbanne, France |
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| Abstract: | In this work, we report on adherent diamond films with thickness of up to 4.5 μm grown on polycrystalline alumina substrates. Prior to deposition, alumina substrates were ultrasonically abraded with mixed poly-disperse slurry that allows high nucleation density of values up to ∼5×1010 particles/cm2. It was estimated that the minimal film thickness achieved for continuous films was ∼320 nm, obtained after a deposition time of 15 min with diamond particles density (DPD) of ∼4×109 particles/cm2. Continuous adherent diamond films with high DPD (∼109 particles/cm2) were obtained also on sapphire surface after abrasion with mixed slurry and 15 min of deposition. However, after longer deposition time, diamond films peeled off from the substrates during cooling.The poor adhesion between the diamond and sapphire is attributed to the weak interface interaction between the film and the substrate and to difference in coefficient of thermal expansion. On the other hand, it is suggested that the reason for good adhesion between diamond film and alumina substrate is that high carbon diffusivity onto alumina grain boundaries allows strong touch-points at the grooves of alumina grains, and this prevents the delamination of diamond film. This adhesion mechanism, promoted by sub-micron diamond grain-size, is allowed by initial high nucleation density.The surface properties, phase composition and microstructure of the diamond films deposited onto alumina were examined by electron energy loss spectroscopy (EELS), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and high-resolution scanning electron microscopy (HR-SEM). The residual stress in the diamond films was evaluated by diamond Raman peak position and compared to a theoretical model with good agreement. Due to the sub-micron grain-size, the intrinsic tensile stress is high enough to partially compensate the thermal compressive stress, especially in diamond films with thickness lower than 1 μm. |
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