Determination of the surface roughness and refractive index of amorphous As40S60 films deposited by spin coating |
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| Affiliation: | 1. Wireless and Photonic Networks Research Centre, Faculty of Engineering, Universiti Putra Malaysia, 43400, Serdang, Selangor, Malaysia;2. Institute of Physics, J. Dlugosz University, Armii Kraowej 13/15, PL -42-201, Czestochowa, Poland;3. Laboratory of Nanosciences Research (LNR), E.A. no 4682, UFR Sciences, University of Reims, 21 rue Clément Ader, 51685, Reims Cedex 02, France;4. Physics Department, Faculty of Science, Ain Sham University, Abbassia, Cairo, 11566, Egypt;5. Research Chair of Exploitation of Renewable Energy Applications in Saudi Arabia, Physics and Astronomy Department, College of Science, King Saud University, P.O. Box 2455, Riyadh, 11451, Saudi Arabia;6. Institute of Optoelectronics and Measuring Systems , Faculty of Electrical Engineering, Czestochowa University of Technology, 17 Armii Krajowej Str., 42-200 Czestochowa, Poland |
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| Abstract: | An envelope method, based on the optical reflection spectrum taken at normal incidence, has been successfully applied to the geometrical–optical characterization of thin dielectric films having significant surface roughness. Such a method allows the determination of the average thickness and the refractive index of the films with accuracies better than 1%, as well as the average amplitude of the surface roughness with an accuracy of about 2%. Amorphous As40S60 thin films have been deposited by spin coating, onto glass substrates, from a solution of the bulk material in n-propylamine. Indications of the surface roughness in these films were found from total (specular plus diffuse) reflectance measurements using an integrating sphere, and also from mechanical measurements using a stylus profiler. The latter technique provided a value for the average surface roughness of 20 ± 4 nm, which is in excellent agreement with the optically determined value of 17.4 ± 0.4 nm. |
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