电子束曝光数据格式的改进设计与实现

根据中国科学院电工研究所研制的DY-2000型实用化电子束曝光系统对曝光图形数据格式的要求及用户的需要,对原曝光文件格式(EDF)进行了改进,利用VC++6.0开发环境实现了EDF格式文件的图形创建、结构体引用以及文件保存,同时增加了多层图形套刻和邻近效应修正数据处理的功能。实验结果表明,改进后的电子束曝光图形文件格式可满足用户的需求,便于用户新建版图文件,同时也提高了文件传输速度及曝光的效率。

Design and Implementation of Exposure Data Format for E-beam Lithography

A file format for the pattern generator in Electron Beam Lithography was introduced,which is designed with the requirement of DY-2000 Practical Electron Beam Lithography System developed by Institute of Electrical Engineering,Chinese Academy of Sciences,and is implemented based on the VC++6.0 developed environment.The process includes drawing graphics,citing structure and saving file.This new file format solves the problem of overlay and provides the property for proximity effect correction.The experiments show that this file format can meet users' demand,be convenient for drawing a new file,and improve the efficiency of data transformation and exposure.