Properties of nanocrystalline and nanocomposite WxZr1?x thin films deposited by co-sputtering |
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Authors: | D Horwat M Dehmas E Aubry J Zollinger S Migot JF Pierson |
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Affiliation: | 1. Laboratoire de Science et Génie des Surfaces (UMR CNRS 7570), Ecole des Mines, Parc de Saurupt, CS 14234, 54042 Nancy Cedex, France;2. Laboratoire de Science et Génie des Matériaux et de Métallurgie (UMR CNRS 7584), Ecole des Mines, Parc de Saurupt, CS 14234, 54042 Nancy Cedex, France;3. Laboratoire de Physique des Matériaux (LPM) (UMR CNRS 7556), Ecole des Mines, Parc de Saurupt, CS 14234, F-54042 Nancy Cedex, France |
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Abstract: | WxZr1?x thin films were deposited at room temperature on glass substrates by co-sputtering tungsten and zirconium targets in argon. The composition was found in the range 0 ≤ x ≤ 0.81. The grain size deduced from X-ray diffraction analysis ranged from 1.3 nm to 16 nm depending on the composition. The events in the resistivity, optical reflectivity and thickness evolutions were correlated with the X-ray diffraction analysis. Depending on the composition, the local organization can be attributed to a nanocrystalline solid solution of W in Zr, to a nanocomposite structure involving ZrW2 nanograins embedded in an amorphous matrix, to ZrW2 Laves phase nanograins and to a nanocrystalline solid solution of Zr in W. For 0 < x ≤ 0.72, the equivalent grain size is very small (less than 2 nm) and the evolution of the resistivity can be fitted by the estimated volume of the material perturbed by the grain boundaries. |
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