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ITO衬底上LiTaO3薄膜的制备与介电特性
引用本文:张德银,黄大贵,李金华,李坤,但迪迪,董政. ITO衬底上LiTaO3薄膜的制备与介电特性[J]. 红外与毫米波学报, 2007, 26(3): 170-173
作者姓名:张德银  黄大贵  李金华  李坤  但迪迪  董政
作者单位:电子科技大学机电工程学院,四川,成都,610054;中国民航飞行学院航空工程学院,四川,广汉,618307;电子科技大学机电工程学院,四川,成都,610054;江苏工业学院功能材料实验室,江苏,常州,213016
基金项目:国家自然科学基金资助项目(60572007),中国民航飞行学院科研基金资助项目(J2005-25)
摘    要:用溶胶凝胶法在ITO衬底上制备了钽酸锂(LiTaO3)薄膜,利用XRD、SEM和AFM对薄膜的晶向、表面形态等作了表征;研究了不同溶剂对LiTaO3溶胶稳定性的影响和不同退火条件对LiTaO3薄膜结晶的影响;利用Al/LiTaO3/ITO结构,测试了薄膜的介电系数和介电损耗.结果表明:每层薄膜都晶化退火比交替使用焦化、结晶退火能生长出质量更好的LiTaO3薄膜;频率1KHz时,介电损耗约0.4,相对介电系数约53.并讨论了介电损耗增大的原因.

关 键 词:钽酸锂薄膜  ITO衬底  退火条件  介电特性
文章编号:1001-9014(2007)03-0170-04
收稿时间:2006-09-15
修稿时间:2006-09-152007-02-12

PREPARATION AND DIELECTRIC PROPERTIES OF LiTaO3 THIN FILM ON THE ITO SUBSTRATE
ZHANG De-Yin,HUANG Da-Gui,LI Jin-Hu,LI Kun,DAN Di-Di,DONG Zheng. PREPARATION AND DIELECTRIC PROPERTIES OF LiTaO3 THIN FILM ON THE ITO SUBSTRATE[J]. Journal of Infrared and Millimeter Waves, 2007, 26(3): 170-173
Authors:ZHANG De-Yin  HUANG Da-Gui  LI Jin-Hu  LI Kun  DAN Di-Di  DONG Zheng
Affiliation:1. Sch. of Mechatronics Eng., Univ. of Electronic Sci. and Technol., Chengdu 610054, China; 2. Aviation Eng. Inst. , Civil Aviation Flight Univ. , Guanghan 618307, China; 3. Functional Material Lab. , Jiangsu Ploytechnic Univ. , Changzhou 213016, China
Abstract:LiTaO3 thin films were prepared on the ITO substrate by sol-gel methods.The performance parameters such as orientation,surface morphology,grain size and the thickness of LiTaO3 thin film were studied by XRD,SEM and AFM.The influence of different solvents on the stability of LiTaO3 sols and the influence of different annealing condition on the preparation of LiTaO3 thin film were analyzed either.The relative dielectric coefficient and dielectric loss of the prepared LiTaO3 thin film were measured by using Al/LiTaO3/ITO structure electrode.The experimental results show that the quality of LiTaO3 thin film with every layer crystallized annealing is better than that with pyrolyzed and crystallized annealing alternately.The relative dielectric coefficient is about 53 and dielectric loss is about 0.4 when the measured frequency is 1kHz.The reason of increaing the dielectric loss of LiTaO3 thin film has been discussed.
Keywords:LiTaO3 thin film  ITO substrate  annealing condition  dielectric properties
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