| 聚焦离子束装置中的图形发生器 |
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| 引用本文： | 马向国,刘同娟,顾文琪.聚焦离子束装置中的图形发生器[J].电子工业专用设备,2007,36(9):25-29. |
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| 作者姓名： | 马向国 刘同娟 顾文琪 |
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| 作者单位： | 北京物资学院,北京,101149;中国科学院电工研究所,北京,100080 |
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| 摘 要： | 聚焦离子束技术(FIB)是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。几十年来,随着关键技术的不断突破和完善,达到了前所未有的发展,所突破的关键技术之一就是图形发生器的使用。
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| 关 键 词： | 聚焦离子束 图形发生器 微纳加工 |
| 文章编号： | 1004-4507（2007）09-0025-05 |
| 修稿时间： | 2007-08-18 |
The Pattern Generator in Focused Ion Beam Equipment |
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| MA Xiang-guo,LIU Tong-juan,GU Wen-qi.The Pattern Generator in Focused Ion Beam Equipment[J].Equipment for Electronic Products Marufacturing,2007,36(9):25-29. |
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| Authors: | MA Xiang-guo LIU Tong-juan GU Wen-qi |
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| Affiliation: | 1 .Beijing Wuzi University, Beijing 101149, China; 2. Institute of Electrical Engineering,Chinese Academy of Sciences, Beijing 100080, China |
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| Abstract: | Focused Ion Beam is an advanced micro/nano technology for figure observation, orientation-making-sample, component analysis, film deposition and maskless etching. With the development and breakthrough of FIB key technology for many years, its technology has reach a high level. The one of these key technology is exact technology of pattern generator. In this paper, the pattern generators in focused ion beam equipment are introduced in detail. |
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| Keywords: | Focused Ion Beam Pattern Generator Micro/Nano Fabrication-Technology |
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