| 半导体激光器腔面镀膜技术研究进展 |
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| 引用本文： | 王致远 刘方楠 李发明. 半导体激光器腔面镀膜技术研究进展[J]. 中国材料科技与设备, 2007, 4(5): 27-30 |
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| 作者姓名： | 王致远 刘方楠 李发明 |
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| 作者单位： | 重庆邮电大学光电工程学院,重庆400065 |
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| 摘 要： | 本文介绍了近年来半导体激光器腔面镀膜技术的研究进展，重点综述了膜系设计，工艺技术、薄膜材料及测试技术等几个方面的研究热点和重要成果，最后还对半导体激光器腔面镀膜的未来进行展望。
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| 关 键 词： | 增透膜 高反膜 脉冲激光沉积 激光烧蚀刻蚀 |
Progress in Research on Facet Coating of Semiconductor Laser |
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| WANG Zhi-yuan ,LIU Fang-nan, LI Fa-ming. Progress in Research on Facet Coating of Semiconductor Laser[J]. Chinese Materials Science Technology & Equipment, 2007, 4(5): 27-30 |
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| Authors: | WANG Zhi-yuan LIU Fang-nan LI Fa-ming |
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| Affiliation: | College of Optoelectronic Engineering,Chongqing University of Posts and Telecommunications, Chongqing,400065,China |
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| Abstract: | This paper introduced the present status of study on facet coating of semiconductor laser, laid a strong emphasis on the focal points and some important achievements in the field of film design principle, manufacturing methods, film material and performance measurement , prospect the future of the facet coating of semiconductor laser. |
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| Keywords: | AR HR Pulse laser deposition Laser ablation etching |
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