Mechanical and electrical properties of micron-thick nitrogen-doped tetrahedral amorphous carbon coatings |
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| Affiliation: | 1. Surface Engineering Department, Implementation Research Division, Korea Institute of Materials Science (KIMS), 797 Changwondaero, Seongsangu, Changwon, Gyeongnam 51508, Republic of Korea;2. Advanced Materials and Manufacturing Laboratory, Department of Mechanical Science and Engineering, Nagoya University, B3-2-641,Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan;1. School of Materials Science and Engineering, Pusan National University, Busan 609-735, Republic of Korea;2. Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan 609-735, Republic of Korea;3. National Core Research Center for Hybrid Materials solution, Pusan National University, Busan 609-735, South Korea |
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| Abstract: | The effect of nitrogen doping on the mechanical and electrical performance of single-layer tetrahedral amorphous carbon (ta-C:N) coatings of up to 1 μm in thickness was investigated using a custom-made filtered cathode vacuum arc (FCVA). The results obtained revealed that the hardness and electrical resistance of the coatings decreased from 65 ± 4.8 GPa (3 kΩ/square) to 25 ± 2.4 GPa (10 Ω/square) with increasing nitrogen gas ratio, which indicates that nitrogen doping occurs through substitution in the sp2 phase. Subsequent AES analysis showed that the N/C ratio in the ta-C:N thick-film coatings ranged from 0.03 to 0.29 and increased with the nitrogen flow rate. Variation in the G-peak positions and I(D)/I(G) ratio exhibit a similar trend. It is concluded from these results that micron-thick ta-C:N films have the potential to be used in a wide range of functional coating applications in electronics. |
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