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抛光过程游离单颗磨粒与光学元件间滚动摩擦接触分析
作者姓名:陈为平  高诚辉  任志英  林春生
摘    要:针对游离单颗磨粒与光学元件滚动接触过程中摩擦、磨损机理分析的不足及如何 有效控制滚动单颗磨粒对光学元件亚表面损伤的影响等问题,基于滚动接触理论,提出了一种 具有分形特征表面的单颗磨粒与光学元件双粗糙面间的摩擦、磨损接触模型,并运用有限元仿 真分析微观动态滚动的接触过程。通过对不同剪切强度下接触力、接触应力、磨粒角度及其对 亚表面损伤的影响等分析,发现随着剪切强度的增强,磨粒与光学元件表面接触界面间的摩擦 系数将减小,最佳的磨粒角度为105°~120°,并且分形特征的单颗磨粒对亚表面损伤的影响要 大于球形特征单颗磨粒,这说明了研究分形特征游离单颗磨粒滚动接触的必要性和重要性,为 更加深刻了解滚动接触过程的摩擦机理提供了借鉴意义。

关 键 词:游离单颗磨粒  亚表面损伤  磨粒角度  滚动接触  有限元分析  

Analysis of Rolling Friction Contact between Free SingleAbrasive and Optical Element
Authors:Chen Weiping  Gao Chenghui  Ren Zhiying  Lin Chunsheng
Abstract:In order to study the deficiency of the friction and wear mechanism analysis and how to effectively control the impact of the subsurface damage during the process of rolling contact between free abrasive and optical element. Based on the rolling contact theory, a rolling contact model of dual fractal surfaces is established between single free abrasive and optical element, and the simulation of the microscopic dynamic rolling contact process is achieved by the use of the FEM simulative analysis. Through the analysis of the contact force, contact stress, abrasive angles and related stress fields under different shear strength, showed that, with the shear strength increased, the friction coefficient of the contact interface between the grain and optical surface will be decreased, the best grinding abrasive angle is 105°–120°, the influence of the fractal abrasives on subsurface damage is greater than the spherical grains, the necessity and importance of the research about the free fractal abrasive in rolling contact is indicated, and a certain significance for deeper understanding of the friction mechanism during the contact process is provided.
Keywords:free single abrasive  subsurface damage  abrasive angles  rolling contact  finite element  analysis  
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