| 集成电路与半导体器件制造中的电子束曝光技术 |
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| 引用本文： | 张俊国.集成电路与半导体器件制造中的电子束曝光技术[J].微细加工技术,1993(1):1-8. |
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| 作者姓名： | 张俊国 |
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| 作者单位： | 电子部第48研究所 长沙 |
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| 摘 要： | 本文叙述了国际上电子束曝光技术的发展趋势,分析了我国电子束曝光技术的发展现状,回顾了电子部四十八所电子束曝光技术的进展及其在微电子器件制造中成功的应用。
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| 关 键 词： | 电子束曝光 集成电路 半导体器件 制造 |
E.B. LITHOGRAPHY TECHNOLOGY USED IN MANUFACTURE OF 1C AND SEMICONDUCTOR DEVICES |
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| Zhang Junguo.E.B. LITHOGRAPHY TECHNOLOGY USED IN MANUFACTURE OF 1C AND SEMICONDUCTOR DEVICES[J].Microfabrication Technology,1993(1):1-8. |
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| Authors: | Zhang Junguo |
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| Abstract: | Developing trend of E.B. lithography technology in the world is presented. Current E.B. lithography technology in China is also described. The development of E.B. lithography technology in 48th Research Institute of the Ministry of Electronics Industry and it's applications to the manufacture of microelectronic devices are reviwed. |
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| Keywords: | electron beam lithography integrated circuit microfabrication |
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