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Properties of Ta–Mo alloy gate electrode for n-MOSFET
Authors:Chung Keun Lee  Jae Young Kim  Shin Nam Hong  Huicai Zhong  Bei Chen  Veena Misra
Affiliation:1. School of Electronic Engineering, Telecommunication and Computer Engineering, Hankuk Aviation University, 200-1, Hwajon-dong, Deokyang-gu, Kyonggi-do, Koyang-City, 412-791, Korea
2. Advanced Micro Devices, Hopewell Junction, NY, 12533, USA
3. Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, NC, 27695, USA
Abstract:
Keywords:
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