Low thermal conductivity of atomic layer deposition yttria-stabilized zirconia (YSZ) thin films for thermal insulation applications |
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Affiliation: | 1. Centro de Nanociencias y Nanotecnología (CNyN), Universidad Nacional Autónoma de México, Ensenada 22860, BC, México;2. Space Charge LLC, San Diego 92109, CA, USA;3. Centro de Investigación Científica y Educación Superior de Ensenada, Ensenada 22860, México;1. Department of Engineering Science, University West, Sweden;2. Treibacher Industrie AG, Austria |
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Abstract: | Thermal insulation applications have long required materials with low thermal conductivity, and one example is yttria (Y2O3)-stabilized zirconia (ZrO2) (YSZ) as thermal barrier coatings used in gas turbine engines. Although porosity has been a route to the low thermal conductivity of YSZ coatings, nonporous and conformal coating of YSZ thin films with low thermal conductivity may find a great impact on various thermal insulation applications in nanostructured materials and nanoscale devices. Here, we report on measurements of the thermal conductivity of atomic layer deposition-grown, nonporous YSZ thin films of thickness down to 35 nm using time-domain thermoreflectance. We find that the measured thermal conductivities are 1.35–1.5 W m?1 K?1 and do not strongly vary with film thickness. Without any reduction in thermal conductivity associated with porosity, the conductivities we report approach the minimum, amorphous limit, 1.25 W m?1 K?1, predicted by the minimum thermal conductivity model. |
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Keywords: | Yttria-stabilized zirconia (YSZ) Atomic layer deposition Thermal insulation applications Thermal conductivity Time-domain thermoreflectance |
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