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Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition |
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| Authors: | Hadar MANIS-LEVY ;Tsachi LIVNEH ;Ido ZUKERMAN ;Moshe H MINTZ |
| Affiliation: | [1]Department of Nuclear Engineering, Ben-Gurion University of the Negev,Beer-Sheva 84105, Israel; [2]NRC-Negev, Beer-Sheva 84190, Israel; [3]Advanced Coatings Center, Rotem Industries Ltd., Mishor Yamin, D.N. Arava 86800, Israel |
| Abstract: | amorphous carbon, PECVD, film deposition, FTIR, Raman |
| Keywords: | amorphous carbon PECVD film deposition FTIR Raman |
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