| 等离子体化学气相沉积(PCVD)硬质膜成膜理论 |
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| 引用本文： | 马胜利,徐可为. 等离子体化学气相沉积(PCVD)硬质膜成膜理论[J]. 兵器材料科学与工程, 2000, 23(2): 39-43,50 |
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| 作者姓名： | 马胜利 徐可为 |
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| 作者单位： | 西安交通大学 |
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| 基金项目： | 国家高技术研究发展计划(863计划);; |
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| 摘 要： | PCVD硬质膜是目前材料表面强化领域的研究热点。介绍了 PCVD硬质膜的成膜理论、特点 ,讨论了等离子体引入化学气相沉积过程中所带来的一些变化 ,给出了现阶段 PCVD成膜理论研究的现状、存在问题及发展趋势。
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| 关 键 词： | 等离子体化学气相沉积 硬质膜 成膜理论 |
| 文章编号： | 1004-244X(2000)02-0039-06 |
| 修稿时间： | 1999-03-15 |
DEPOSITION THEORY OF THIN HARD PCVD COATINGS |
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| Ma Shengli,Xu Kewei. DEPOSITION THEORY OF THIN HARD PCVD COATINGS[J]. Ordnance Material Science and Engineering, 2000, 23(2): 39-43,50 |
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| Authors: | Ma Shengli Xu Kewei |
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| Abstract: | It was an interesting field in recent years to strengthen the substrate surface with the thin hard coatings produced by plasma chemical vapour deposition(PCVD).So,the theory of deposition of thin hard coating and its features were introduced in this paper,and the change caused by the plasma led into the PCVD process was discussed.The present situation,existing problems and developmental trend of the study of the deposition theory of PCVD thin hard coating were showed,too. |
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| Keywords: | PCVD thin hard coating deposition theory |
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