Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering |
| |
| Authors: | Matthias Krause, Laurent Bedel, Anthony Taupeau, Ulrich Kreissig, Frans Munnik, Gintautas Abrasonis, Andreas Kolitsch, Gy rgy Radnoczi, Zsolt Czig ny,Annick Vanhulsel |
| |
| Affiliation: | aInstitute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf, POB 510119, 01314 Dresden, Germany;bCEA Grenoble, DRT/LITEN/DTNM/LTS, 17 rue des martyrs 38054 Grenoble cedex 9, France;cResearch Institute for Technical, Physics and Materials Science, Hungarian Academy of Sciences, 1121 Budapest XII., Konkoly-Thege u. 29-33, Hungary;dVITO-Materials Technology, Boeretang 200, B-2400 Mol, Belgium |
| |
| Abstract: | BCxNy thin films deposited at 250 °C by pulsed reactive magnetron sputtering of a B4C target in an Ar/N2 plasma were studied by elastic recoil detection analysis, Fourier transform infrared, Raman, and photoelectron spectroscopy, electron microscopy, and nanoindentation. In the concentration range of 6% to 100% N2 in the sputter plasma the segregation into nanocrystalline hexagonal boron nitride and amorphous sp2 carbon is the dominant process during the film growth. The stoichiometric ratio and structural details of the major phases depend on the N2 concentration in the plasma and have significant influence on the Young′s modulus and the elastic recovery of the BCxNy thin films. |
| |
| Keywords: | BCxNy Thin films Hard coatings Magnetron sputtering Spectroscopy Structural properties Mechanical properties |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
