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纳米SiO2改性光固化成型材料的研究
引用本文:唐富兰,莫健华,薛邵玲.纳米SiO2改性光固化成型材料的研究[J].高分子材料科学与工程,2007,23(5):210-213.
作者姓名:唐富兰  莫健华  薛邵玲
作者单位:华中科技大学塑性成型模拟及模具技术国家重点实验室,湖北,武汉,430074;广西大学化学化工学院,广西,南宁,530004
基金项目:湖北省科委重点科技研究基金资助项目(2001P0205)
摘    要:将改性后的纳米SiO2原位分散到自由基-阳离子混杂型的光敏树脂中,通过黏度测定和SEM观察,发现纳米SiO2在光敏树脂中分散性好。这种改性的光敏树脂应用于光固化成型系统,实验结果表明:改性后的光敏树脂的临界曝光量增大而透射深度变小、其成型件的耐热性有所提高;当SiO2含量在1%~2%时,成型件的硬度和弯曲强度有明显的提高。

关 键 词:光敏树脂  光固化成型材料  纳米SiO2
文章编号:1000-7555(2007)05-0210-04
修稿时间:2006-06-12

Study on Radiation-Curable Composition Modified by Nanosilica
TANG Fu-lan,MO Jian-hua,XUE Shao-ling.Study on Radiation-Curable Composition Modified by Nanosilica[J].Polymer Materials Science & Engineering,2007,23(5):210-213.
Authors:TANG Fu-lan  MO Jian-hua  XUE Shao-ling
Abstract:The modified nano SiO2 was filled into free-radical and cationic mixed-type radiation-curable composition.Viscosity measurement and SEM observation showed that the silica nanoparticles were well dispersed in photosensitive resins.The modified photosensitive resin were used in stereolithography prototyping.The results of tests indicate that the critical exposure increases,the penetration depth becomes smaller,and the thermal stability of cured material also improves;when content of SiO2 is between 1% to 2%,the hardness and flexural strength increase obviously.
Keywords:photosensitive resin  radiation-curable composition  nano SiO2
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