Gold Nitride: Preparation and Properties |
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| Authors: | L Šiller L Alves A C Brieva Yu V Butenko M R C Hunt |
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| Affiliation: | (1) School of Chemical Engineering and Advanced Materials, Newcastle University, Newcastle upon Tyne, NE1 7RU, UK;(2) Department of Physics, Durham University, Durham, DH1 3LE, UK |
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| Abstract: | We review the currently known methods of producing gold nitride and report on the influence of electrically isolated substrates
on the growth of gold nitride films by reactive ion sputtering (RIS). It is found that isolation of the substrate decreases
grain size and increases nitrogen content, the latter attributed to longer nitrogen ion lifetime on the surface of the growing
film. The chemical reactivity of gold nitride is compared with that of pure gold films using the adsorption of 1-dodecyl mercaptan
(CH3(CH2)11SH) as a model system and it is found that there is no significant difference between gold films and gold nitride in terms
of Au–S binding. However, gold nitride nanoparticles are suggested to be worthy of further investigation in terms of their
catalytic properties.
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| Keywords: | Growth Photoemission Self assembled monolayers Metal nitrides |
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