| 单分散性SiO2的制备与应用 |
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| 引用本文： | 胡兵,蒋斌波,陈纪忠. 单分散性SiO2的制备与应用[J]. 化工进展, 2005, 24(6): 603-606,611 |
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| 作者姓名： | 胡兵 蒋斌波 陈纪忠 |
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| 作者单位： | 浙江大学化学工程与生物工程学系,杭州,310027 |
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| 摘 要： | 系统地介绍了单分散性二氧化硅的制备方法及其优缺点，列举了单分散性二氧化硅在有关方面的应用；最后在归纳前人研究成果的基础上，提出了超临界流体快速膨胀法制备单分散性二氧化硅的设想。
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| 关 键 词： | 单分散性二氧化硅 制备 应用 |
| 文章编号： | 1000-6613(2005)06-0603-04 |
Manufacture Technologies and Applications of Mono-disperse Silicon Dioxide |
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| Hu Bing,Jiang Binbo,CHEN Jizhong. Manufacture Technologies and Applications of Mono-disperse Silicon Dioxide[J]. Chemical Industry and Engineering Progress, 2005, 24(6): 603-606,611 |
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| Authors: | Hu Bing Jiang Binbo CHEN Jizhong |
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| Abstract: | Mono disperse silicon dioxide particles are widely used in catalytic reaction, medicine and photo electric devices etc. because of their special properties. This paper (introduces) the (manufacture) technologies and applications of mono disperse silicon dioxide and their advantages and disadvantages. The rapid expansion of supercritical solution (RESS) is proposed to prepare fine mono disperse silicon dioxide with uniform size distribution. |
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| Keywords: | mono disperse silicon dioxide manufacture application |
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