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New high fill-factor triangular microlens array fabrication method using UV proximity printing |
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| Authors: | Tsung-Hung Lin Hsiharng Yang Ching-Kong Chao Shih-Yu Hung |
| Affiliation: | (1) Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, 105, Taiwan;(2) Institute of Precision Engineering, National Chung Hsing University, Taichung, 402, Taiwan;(3) Department of Automation Engineering, Nan Kai Institute of Technology, Nantou, 542, Taiwan |
| Abstract: | A simple and effective method for fabricating a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling the printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated in photoresist. This is because to the UV light diffraction deflects away from the aperture edges and produces a certain exposure in photoresist material outside the aperture edges. This method can precisely control the geometric profile of a high fill-factor triangular microlens array. The experimental results showed that the triangular photoresist microlens array could be formed automatically when the printing gap ranged from 240 to 840 μm. The gapless triangular microlens array will be used to increase the luminance for the backlight module of liquid crystal displays. An erratum to this article can be found at |
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