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Inherently UV Photodegradable Poly(methacrylate) Gels
Authors:Johannes M Scheiger  Shuai Li  Marius Brehm  Andreas Bartschat  Patrick Theato  Pavel A Levkin
Affiliation:1. Karlsruhe Institute of Technology (KIT), Institute of Biological and Chemical Systems – Functional Molecular Systems (IBCS-FMS), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Karlsruhe Institute of Technology (KIT), Institute for Chemical Technology and Polymer Chemistry (ITCP), Engesserstraße 18, 76128 Karlsruhe, Germany;2. Karlsruhe Institute of Technology (KIT), Institute of Biological and Chemical Systems – Functional Molecular Systems (IBCS-FMS), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;3. Karlsruhe Institute of Technology (KIT), Institute of Automation and Applied Informatics (IAI), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany;4. Karlsruhe Institute of Technology (KIT), Institute for Chemical Technology and Polymer Chemistry (ITCP), Engesserstraße 18, 76128 Karlsruhe, Germany

Karlsruhe Institute of Technology (KIT), Soft Matter Synthesis Laboratory, Institute for Biological Interfaces III (IBG 3), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Abstract:Organogels (hydrophobic polymer gels) are soft materials based on polymeric networks swollen in organic solvents. They are hydrophobic and possess a high content of solvent and low surface adhesion, rendering them interesting in applications such as encapsulants, drug delivery, actuators, slippery surfaces (self-cleaning, anti-waxing, anti-bacterial), or for oil-water separation. To design functional organogels, strategies to control their shape and surface structure are required. Herein, the inherent UV photodegradability of poly(methacrylate) organogels is reported. No additional photosensitizers are required to efficiently degrade organogels (d ≈ 1 mm) on the minute scale. A low UV absorbance and a high swelling ability of the solvent infusing the organogel are found to be beneficial for fast photodegradation, which is expected to be transferrable to other gel photochemistry. Organogel arrays, films, and structured organogel surfaces are prepared, and their extraction ability and slippery properties are examined. Films of inherently photodegradable organogels on copper circuit boards serve as the first ever positive gel photoresist. Spatially photodegraded organogel films protect or reveal copper surfaces against an etchant (FeCl3 aq.).
Keywords:lubricant-infused surfaces  organogels  photodegradation  positive photoresist  UV light
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