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不同施氮量条件下烤烟叶面积系数与冠层光谱参数的相关性
引用本文:王建伟,李树人,周汉平,张仕祥,魏春阳,薛超群. 不同施氮量条件下烤烟叶面积系数与冠层光谱参数的相关性[J]. 烟草科技, 2011, 0(3)
作者姓名:王建伟  李树人  周汉平  张仕祥  魏春阳  薛超群
作者单位:1. 中国烟草总公司郑州烟草研究院,郑州高新技术产业开发区枫杨街2号,450001
2. 河南省南阳市烟草公司方城县公司,河南省方城县城关镇文化路233号,473200
基金项目:中国烟草总公司郑州烟草研究院院长基金"基于冠层光谱烤烟氮素营养相关信息提取(112008CA0380)"资助
摘    要:为明确氮肥施用量对烤烟叶面积系数(LAI)和冠层光谱参数的影响,测定了不同氮肥施用量条件下烤烟不同生育期的冠层光谱特征和LAI,对二者随施氮量的变化进行了分析,并利用相关分析和回归分析确定了二者的相关性.结果表明:在一定的施氮量范围内,施氮量增加对烤烟LAI有明显的促进效应,但在打顶期的效应不及团棵期和旺长期明显;一定范围内随施氮量增加,烤烟冠层光谱中可见光波段的反射率降低,而近红外波段的反射率提高;可见光范围内500,550,600,650和670 nm处反射率与LAI呈极显著负相关,近红外区域内780和800 nm处反射率与LAI呈显著正相关,1050和1100 nm处反射率与LAI呈极显著正相关,与LAI相关性最强的植被指数为NDVI(1050,550),用其构建的回归模型预测效果较好.

关 键 词:烤烟  叶面积系数  冠层光谱  施氮量

Correlation of Leaf Area Index with Canopy Reflectance Spectrum of Flue-cured Tobacco Under Different Nitrogen Application Rate
WANG JIAN-WEI,LI SHU-REN,ZHOU HAN-PING,ZHANG SHI-XIANG,WEI CHUN-YANG,XUE CHAO-QUN. Correlation of Leaf Area Index with Canopy Reflectance Spectrum of Flue-cured Tobacco Under Different Nitrogen Application Rate[J]. Tobacco Science & Technology, 2011, 0(3)
Authors:WANG JIAN-WEI  LI SHU-REN  ZHOU HAN-PING  ZHANG SHI-XIANG  WEI CHUN-YANG  XUE CHAO-QUN
Affiliation:WANG JIAN-WEI(1),LI SHU-REN(2),ZHOU HAN-PING(1),ZHANG SHI-XIANG(1),WEI CHUN-YANG(1),and XUE CHAO-QUN(1) 1.Zhengzhou Tobacco Research Institute of CNTC,Zhengzhou 450001,China 2.Fangcheng County Branch of Henan Province Nanyang Tobacco Company,Fangcheng 473200,Henan,China
Abstract:To confirm the effects of different nitrogen application rate on leaf area index(LAI) and canopy reflectance spectrum of flue-cured tobacco,the canopy reflectance spectrum and LAI in spherical plant stage,fast growing stage and topping stage were determined,and the correlation between them was analyzed.The results showed that: within a certain range of nitrogen application rates,LAI was promoted obviously with the increase of nitrogen fertilizer application rate during the three growing stages,while the pro...
Keywords:Flue-cured tobacco  Leaf area index  Canopy reflectance spectrum  Nitrogen application rate  
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