Surface properties of doped and undoped TiO2 thin films deposited by magnetron sputtering

In this work, transparent titanium dioxide (TiO₂) thin films were deposited onto microscope glass slides by means of the d.c. reactive magnetron sputtering method. The films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), UV-visible spectroscopy (UV) and contact angle analysis using the Owens-Wendt method for the surface energy calculation. The photocatalytic activity of the films was tested by measuring the photodegradation of Rhodamine-B (RhB) dye under radiation of UV light. Iron-doped TiO₂ films were also prepared in order to study the Fe-doping effect on TiO₂ photocatalytic activity. The influences of different iron concentrations on the contact angle of the series of Fe-doped TiO₂ thin films, were investigated. The influences of total sputtering pressures on TiO₂ photocatalytic activity were also investigated. It was observed that the photocatalytic activity of the TiO₂ thin films was slightly improved by increasing the total sputtering pressure. Moreover, it was also observed that in general, iron-doping was detrimental for photocatalytic activity, nevertheless the films with low iron concentrations showed better photocatalytic activity than those with high iron concentrations. It was found that iron-doping has changed the wettability appetency of TiO₂ coated surfaces.