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Effects of Mg doping on structural, optical, and electrical properties of CuScO2(0001) epitaxial films
Authors:Yoshiharu Kakehi  Kazuo Satoh  Atsushi Ashida
Affiliation:a Technology Research Institute of Osaka Prefecture, 2-7-1 Ayumino, Izumi, Osaka 594-1157, Japan
b Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai 599-8531, Japan
Abstract:CuScO2 thin films with different Mg concentrations were grown on a-plane sapphire substrates by combining the two-step deposition and post-annealing techniques using Cu2(Sc1−xMgx)2Oy X = 0.01, 0.05, 0.10] targets. The effects of the Mg doping in the Sc-site on the structural, optical, and electrical properties of the films were investigated. A Mg-doped CuScO23R](0001) epitaxial film was obtained at a Mg concentration of 1 at%. The slight increase in the a-axis lattice constant and the slight decrease in the c-axis lattice constant of the film were confirmed using two-dimensional X-ray reciprocal space mapping. No significant increase in optical absorption was observed in the film, and the energy gap for direct allowed transition was estimated at 3.7 eV. The film showed an increase in the electrical conductivity and carrier concentration and a decrease in the Hall mobility compared with those of the non-doped epitaxial film. The decrease in the overlap of Cu 3d orbitals due to the increase in the a-axis lattice constant is one cause of the decrease in the Hall mobility of the film. The temperature dependence of the electrical transport properties of the film exhibited semiconducting characteristics, and the activation energy estimated from the temperature dependence of the carrier concentration was 0.55 eV.
Keywords:p-Type transparent semiconductor  Delafossite  Mg-doped CuScO2  Epitaxial film  Two-step deposition  Post-annealing treatment  Pulsed laser deposition
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