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MIS隧道器件电流-电压特性的数值模拟
引用本文:夏永伟,G.Pananakakis,G.Kamarinos. MIS隧道器件电流-电压特性的数值模拟[J]. 半导体学报, 1989, 10(11): 822-832
作者姓名:夏永伟  G.Pananakakis  G.Kamarinos
作者单位:中国科学院半导体研究所,法国国家科学研究中心格勒诺布尔半导体器件物理实验室,法国国家科学研究中心格勒诺布尔半导体器件物理实验室 北京
摘    要:本文建立了MLS隧道器件的电流-电压特性的数值模拟程序,提出了一种新的计算方法:龙格-库塔数值积分与边界条件的预估-校正处理相结合的算法.利用建立的程序模拟计算了两种不同氧化层厚度的MIS隧道器件的电流-电压特性.对TiW/Si肖特基二极管,考虑了界面态的静态和动态影响,模拟特性和实验结果相比,令人满意的一致.

关 键 词:MIS 隧道器件 数值模拟 电流 电压

Numerical Simulation of Current-Voltage Characteristics of MIS Tunnel Devices
Xia Yonghei/Institute of Semiconductors,Academia SinicaGeorges Pananakakis/Laboratoire de Physique des Composants a Semiconductcurs,CNRS UA-ENSERG,Grencble,FranceGeorges Kamarinos/Laboratoire de Physique des Composants a Semiconductcurs,CNRS UA-ENSERG,Grencble,France. Numerical Simulation of Current-Voltage Characteristics of MIS Tunnel Devices[J]. Chinese Journal of Semiconductors, 1989, 10(11): 822-832
Authors:Xia Yonghei/Institute of Semiconductors  Academia SinicaGeorges Pananakakis/Laboratoire de Physique des Composants a Semiconductcurs  CNRS UA-ENSERG  Grencble  FranceGeorges Kamarinos/Laboratoire de Physique des Composants a Semiconductcurs  CNRS UA-ENSERG  Grencble  France
Affiliation:Xia Yonghei/Institute of Semiconductors,Academia SinicaGeorges Pananakakis/Laboratoire de Physique des Composants a Semiconductcurs,CNRS UA840-ENSERG,Grencble,FranceGeorges Kamarinos/Laboratoire de Physique des Composants a Semiconductcurs,CNRS UA840-ENSERG,Grencble,France
Abstract:A program for the numerical simulation of the current-voltage characteristics of MIS tun-nel devices is developed.This paper presents a new and efficient computational method. Thedifferential equations are integrated using Runge-Kutta integral method and the boundary con-ditions are satisfied according to a prediction-correction method.The current-voltage (I-V)characteristics for MIS tunnel diodes with thin and thick oxide are calculated using the prog-ram.Taking into account both the electrostatic and kinctic influences of interface states, asatisfactory fitting between the simulated and the experimental results of I-V characteristicsfer TiW/Si Schottky diode is obtained.
Keywords:MIS tunnel device  numerical simulation  Computational method
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