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高衍射效率全息光栅的制作与复制工艺研究
引用本文:臧甲鹏,王朝阳.高衍射效率全息光栅的制作与复制工艺研究[J].现代科学仪器,1999(5):46-48.
作者姓名:臧甲鹏  王朝阳
作者单位:北京市计量科学研究所!100029(臧甲鹏),清华大学光测力学研究室!100081(王朝阳)
摘    要:本文根据正性光致抗蚀的感光显影特性,推导出了全息光栅沟槽深度公式,分析了影响光栅糟型结构的因素,建立了光栅沟槽模型。并根据论理论制作出了衍射效率高达65%的 2400线/毫米的全息平面反射光栅。本文还介绍了全息光栅复制技术,解决了高质量光栅昂贵的生产成本和大批量生产问题。

关 键 词:正性光致抗蚀剂  光栅沟槽  衍射效率  光栅复制

The Fabrication and Replication of Holographic Grating with High Diffraction Efficiency
Zang Jiapeng,Wang Chaoyang.The Fabrication and Replication of Holographic Grating with High Diffraction Efficiency[J].Modern Scientific Instruments,1999(5):46-48.
Authors:Zang Jiapeng  Wang Chaoyang
Affiliation:Zang Jiapeng;Wang Chaoyang (Beijing Metrological Science Institute 100029) (Tsinghua University 100081 )
Abstract:In this paper a groove-depth formula of holographic grating is derived according to the exposure and development characteristics of positive photoresist, then the typical shapes of groove are discussed. Using this theory a 2400lines/mm reflecting plane holographic grating, whose diffraction efficiency in the UV region is about 65% was fabricated, and the replica of some holographic gratings, is made by the replication technology of grating.
Keywords:Positive photoresist Groove profile of grating diffraction efficiency Replication of grating    
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