脉冲阴极弧金属等离子体源的调试及其应用

对脉冲阴极弧金属等离子体源的工作参数进行了测量,研究了离子流与磁导管偏压以及磁场电流与离子流之间的关系,确定了其最佳工作参数.并应用该脉冲阴极弧金属等离子体源和等离子体浸没离子注入与沉积技术制备了TiC薄膜.对改性层的显微硬度、摩擦磨损性能和膜基结合力进行了测试分析.结果表明:合成TiC薄膜后,试样的显微硬度、摩擦磨损性能得到了明显的改善,并且膜层与基体之间的临界载荷为36.03 N.

Adjustment and Application of Pulsed Cathodic Arc Metal Plasma Source

The pulsed cathodic arc metal plasma source was optimized by studying the influence of two factors,including the bias voltage of the magnetic duct and the current of the magnetic coils,on the ion beam current.TiC films were grown by plasma immersion ion implantation and deposition(PIIID) with the optimized plasma source.The as-deposited films were characterized with tests of micro-hardness,pin-on-disc and scratch.The results show that its mechanical properties,such as its micro-hardness,its friction coefficient and its wear resistance,significantly improve.For instance,the critical load in the scratch test is 36.03 N.