| 脉冲偏压幅值对TiN／TiAlN多层薄膜微观结构和性能的影响 |
| |
| 引用本文： | 魏永强,田修波,巩春志,杨士勤.脉冲偏压幅值对TiN／TiAlN多层薄膜微观结构和性能的影响[J].材料研究学报,2011(6):630-636. |
| |
| 作者姓名： | 魏永强 田修波 巩春志 杨士勤 |
| |
| 作者单位： | 哈尔滨工业大学现代焊接生产技术国家重点实验室;郑州航空工业管理学院机电工程学院 |
| |
| 基金项目： | 国家自然科学基金10905013和10975041资助项目~~ |
| |
| 摘 要： | 采用电弧离子镀的方法，通过改变脉冲偏压幅值在M2高速钢表面制备了TiN／TiAlN多层薄膜，研究了脉冲电压幅值TiN／TiAlN多层薄膜微观结构和性能的变化。随着脉冲偏压幅值的增加，薄膜表面的大颗粒数目明显减少。EDX结果表明，脉冲偏压幅值的增加还引起Al／Ti原子比的降低。TiN／TiAlN多层薄膜主要以（111）晶...
|
| 关 键 词： | 材料表面与界面 TiN/TiAlN多层薄膜 电弧离子镀 硬度 微观结构 摩擦性能 |
Effect of Pulsed Bias Voltage on the Microstructures and properties of TiN/TiAlN Multilayer Coatings |
| |
| WEI Yongqiang,TIAN Xiubo, GONG Chunzhi,YANG Shiqin.Effect of Pulsed Bias Voltage on the Microstructures and properties of TiN/TiAlN Multilayer Coatings[J].Chinese Journal of Materials Research,2011(6):630-636. |
| |
| Authors: | WEI Yongqiang TIAN Xiubo GONG Chunzhi YANG Shiqin |
| |
| Affiliation: | 1.State Key Lab of Advanced Welding Production Technology,Harbin Institute of Technology,Harbin 150001 2.School of Mechanical Engineering,Zhengzhou Institute of Aeronautics Industry Management,Zhengzhou 450015 |
| |
| Abstract: | TiN/TiAIN multilayer coatings were prepared by arc ion plating with different pulsed bias voltages.With the increase of pulsed bias voltage,the amounts of the macroparticles were largely reduced.The increase of the pulsed bias voltage caused the decrease of Al/Ti atom ratio.The multilayer coatings exhibited growth in preferred orientation of(111) plane with the grain size ranging from 8nm to 14nm.The hardness of TiN/TiAIN multilayer coatings was over 36GPa,which was 3.9 times that of M2 high speed substrate.All the adhesion strength of TiN/TiAIN multilayer coatings was more than 60 N. All the TiN/TiAIN multilayer coatings showed better wear resistance. |
| |
| Keywords: | surface and interface in the materials TiN/TiAIN multilayer coatings arc ion plating hardness microstructure tribological properties |
| 本文献已被 CNKI 等数据库收录！ |
