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Carbon nitride layers created by laser deposition combined with RF discharge
Affiliation:1. Department of Chemistry, Bar-Ilan University, Ramat Gan 5290002, Israel;2. Institute of Nanotechnology & Advanced Materials (BINA), Bar-Ilan University, Ramat Gan 5290002, Israel;3. Faculty of Life Sciences, Bar-Ilan University, Ramat Gan 5290002, Israel
Abstract:The structure, composition and bonding of carbon nitride films created by pulsed laser deposition in combination with radio-frequency discharge for nitrogen activation were studied by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) and by Raman spectroscopy for various deposition conditions. XPS measurements revealed a maximum N/C of ∼0.5 and an increased number of N-sp3C bonds for lower N/C values. FTIR and Raman spectra indicate the presence of a polymeric phase.
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