Carbon transition efficiency and process cost in high-rate,large-area deposition of diamond films by DC arc plasma jet |
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Affiliation: | 1. Institute of Mechanics, Chinese Academy of Sciences, Beijing 100080, PR China;2. University of Science and Technology Beijing, Beijing 100083, PR China;1. Laboratory of Nano Surface Engineering, School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China;2. College of Materials Science and Engineering, Qiqihar University, Qiqihar 161006, China;3. Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201899, China;4. National Engineering Research Center for High-speed EMU, CSR Qingdao Sifang Co. Ltd., Qingdao 266111, China;1. Materials Engineering Department, Institute of Plasma Physics ASCR, v.v.i., Za Slovankou 3, Prague 8, Czech Republic;2. Department of Electrotechnology, Faculty of Electrical Engineering, Czech Technical University in Prague, Technicka 2, Prague 6, Czech Republic;3. Center for Thermal Spray Research, Department of Materials Science & Engineering, Stony Brook University, Stony Brook, NY 11794-2275, USA |
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Abstract: | A new DC plasma torch in which arc jet states and deposition parameters can be regulated over a wide range has been built. It showed advantages in producing stable plasma conditions at a small gas flow rate. Plasma jets with and without magnetically rotated arcs could be generated. With straight arc jet deposition, diamond films could be formed at a rate of 39 μm/h on Mo substrates of Φ 25 mm, and the conversion rate of carbon in CH4 to diamond was less than 3%. Under magnetically rotated conditions, diamond films could be deposited uniformly in a range of Φ 40 mm at 30 μm/h, with a quite low total gas flow rate and high carbon conversion rate of over 11%. Mechanisms of rapid and uniform deposition of diamond films with low gas consumption and high carbon transition efficiency are discussed. |
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