Plasma-assisted chemical vapor deposition process for depositing smooth diamond coatings on titanium alloys at moderate temperature |
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| Affiliation: | 1. School of Material Science and Engineering, University of Jinan, Jinan 250022, China;2. Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Jinan 250022, China;1. College of Science, Beijing University of Civil Engineering and Architecture, Beijing 100044, China;2. Department of Physics, Capital Normal University, Beijing 100048, China;3. LCP, Institute of Applied Physics and Computational Mathematics, Beijing 100088, China;4. Center for Fusion Energy Science and Technology, CAEP, Beijing 100084, China;5. Center for Applied Physics and Technology, Peking University, HEDPS, Beijing 100871, China;6. Center for Applied Physics and Technology, Peking University, HEDPS, Beijing 100871, China;7. Compression Science Research Center, CAEP, Mianyang 621900, China |
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| Abstract: | A simple process has been perfected to deposit smooth fine-grained diamond coatings at 600°C on titanium alloys or titanium-coated surfaces. It consists of a two-step microwave plasma-assisted chemical vapor deposition (PACVD) procedure including first the deposition of a sacrificial sp2-carbon containing layer from a methane-rich CH4–H2 mixture and then the diamond growth from a CO2–CH4 inlet mixture. Scanning electron microscopy, X-ray diffraction, visible and UV Raman spectroscopy show that the coatings are smooth and mainly composed of crystalline diamond with a fine-grained morphology. The results are compared with the results obtained with classical rough polycrystalline coatings deposited from 8% CO–H2. Optical emission spectroscopy reveals important differences between the plasma species produced for the deposition of these smooth coatings and the plasma species produced for the deposition of both polycrystalline coatings from 1% CH4–H2 or 8% CO–H2 mixture and nanocrystalline films from Ar–CH4(–H2). |
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