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Thermal expansion of the W5Si3 and T2 phases of the W–Si–B system investigated by high-temperature X-ray diffraction
Affiliation:Faculdade de Engenharia Química de Lorena (FAENQUIL), Departamento de Engenharia de Materiais (DEMAR), Polo Urbo-Industrial, Gleba AI-6, Caixa Postal 116, 12600-970, Lorena, SP, Brazil
Abstract:The coefficients of thermal expansion (CTE) of the W5Si3 and T2 phases of the W–Si–B system were determined using high-temperature X-ray diffraction in the 298–1273 K temperature interval. Alloys with nominal compositions 62.5W37.5Si (at%) and 58W21Si21B (at%) were prepared from high-purity materials through arc melting followed by heat treatment at 2073 K for 12 h under argon atmosphere. The highly different thermal expansion coefficients of W5Si3 along the a (5.0 × 10?6 K?1) and c (16.3 × 10?6 K?1) axes lead to a high thermal expansion anisotropy (αc/αa ? 3.3). On the other hand, the T2-phase exhibits similar thermal expansion coefficients along the a (6.9 × 10?6 K?1) and c (7.6 × 10?6 K?1) axes, indicating a behavior close to isotropic (αc/αa ? 1.1).
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