| 应用IAD工艺在室温塑料片上淀积MgF2减反膜 |
| |
| 引用本文： | 高扬,周鹏飞. 应用IAD工艺在室温塑料片上淀积MgF2减反膜[J]. 光学仪器, 1991, 13(2): 20-24 |
| |
| 作者姓名： | 高扬 周鹏飞 |
| |
| 作者单位： | 上海航天局803所，上海机械学院 |
| |
| 摘 要： | 本文介绍了应用离子辅助淀积技术(IAD)在室温塑料基片(CR-39)上淀积MgF_2减反膜。应用IAD工艺在塑料基片上淀积的MgF_2单层减反膜光学性能稳定,牢固度耐磨性等机械强度指标明显提高。XRD分析表明离子辅助轰击有助于薄膜结构晶化。应用该工艺可以解决由于塑料基片不能加高温烘烤因而无法制得牢固优质膜层的问题,这无疑为塑料基片的表面处理开辟了一条新途径。
|
| 关 键 词： | IAD 塑料元件 塑料片 MgF2 减反膜 |
Depositing MgF_3 Anti-reflection Coating on Plastic under Normal Temperature by Using IAD Technology |
| |
| Abstract: | This paper describes depositing MgF_2 anti-reflection coating on plastic under normal temperature by using IAD technology The single layer MgF_2 coating produced by this method features stable in performance, obvious improvement in anti-friction and reliability.XRD analysis shows the ion-aided bombardment benefite the crystallization of layer structure.The technology resolves the problem of being impossible to make a reliable coating on plastic material owing to unable to heat the material to high otemperature.It certainly paves the way for surface treatment of plastic material. |
| |
| Keywords: | |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《光学仪器》浏览原始摘要信息 |
|
点击此处可从《光学仪器》下载全文 |
|
