Control of growth and structure of Ag films by the driving frequency of magnetron sputtering

The growth and structural properties of Ag films prepared by radio-frequency (2,13.56 and 27.12 MHz) and very-high-frequency (40.68 and 60 MHz) magnetron sputtering were investigated.Using 2 MHz sputtering,the Ag film has a high deposition rate,a uniform and smooth surface and a good fcc structure.Using 13.56 and 27.12 MHz sputtering,the Ag films still have a high deposition rate and a good fcc structure,but a non-uniform and coarse surface.Using 40.68 MHz sputtering,the Ag film has a moderate deposition rate and a good fcc structure,but a less smooth surface.Using 60 MHz sputtering,the Ag film has a uniform and smooth surface,but a low deposition rate and a poor fcc structure.The growth and structural properties of Ag films are related to the ions' energy and flux density.Therefore,changing the driving frequency is a good way to control the growth and structure of the Ag films.