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直流磁控溅射Ni49.54Mn29.59Ga20.87磁驱动记忆合金薄膜的XPS研究
引用本文:高来勖,刘超,高智勇,安旭,蔡伟,赵连城. 直流磁控溅射Ni49.54Mn29.59Ga20.87磁驱动记忆合金薄膜的XPS研究[J]. 功能材料, 2007, 38(1): 50-52
作者姓名:高来勖  刘超  高智勇  安旭  蔡伟  赵连城
作者单位:1. 黑龙江大学,电子工程黑龙江省高校重点实验室,黑龙江,哈尔滨,150080
2. 哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001
摘    要:采用直流磁控溅射技术沉积了Ni49.54Mn29.59Ga20.87磁驱动形状记忆合金薄膜.XRD结果表明,Ni49.54Mn29.59Ga20.87薄膜室温下为5层调制型结构马氏体.X射线光电子能谱(XPS)分析表明,放置于空气中2个月的沉积态薄膜表面吸附少量氧和碳杂质.随Ar 刻蚀深度的增加,表面C杂质易被剥蚀掉,而部分氧杂质以MnO状态存在;Ni、Mn、Ga元素含量由薄膜表面向内层逐渐增加,化学价由正价向零价转变.

关 键 词:Ni-Mn-Ga  磁驱动形状记忆合金  薄膜  溅射
文章编号:1001-9731(2007)01-0050-03
修稿时间:2006-07-12

XPS study of Ni49.54Mn29.59Ga20.87 magnetically driven shape memory alloy thin film fabricated by D. C magnetron sputtering technique
GAO Lai-xu,LIU Chao,GAO Zhi-yong,AN Xu,CAI Wei,ZHAO Lian-cheng. XPS study of Ni49.54Mn29.59Ga20.87 magnetically driven shape memory alloy thin film fabricated by D. C magnetron sputtering technique[J]. Journal of Functional Materials, 2007, 38(1): 50-52
Authors:GAO Lai-xu  LIU Chao  GAO Zhi-yong  AN Xu  CAI Wei  ZHAO Lian-cheng
Affiliation:1. HLJ Province Key Lab of Senior-Education for Electronic Engineering HLJ University, Harbin 150080, China 2. School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China
Abstract:Ni_(49.54)Mn_(29.59)Ga_(20.87) magnetically driven shape memory alloy thin film has been deposited on silicon substrates by means of D.C magnetron sputtering technique.XRD pattern shows that the thin film is five-layered martensite phase at room temperature.The surface characteristics of the thin film are also investigated by X-ray electron spectroscopy(XPS).The results show that the film surface absorbs lots of O and C when it was put into air for 2months.With the increasing of Ar~+ sputtering depth,the contaminations of C element can be removed,but contaminations of O formed MnO exist in the film.The contents of Ni,Mn and Ga are increasing from the surface to inside,along with the transition from the ionic bonded atom to metal atom.
Keywords:Ni-Mn-Ga  magnetically driven shape memory alloy   thin film  sputtering
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