| 常压化学汽相沉积TiOx纳米光学薄膜及其用于太阳电池减反射膜的研究 |
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| 引用本文： | 杨宏,王鹤,于化丛,奚建平,胡宏勋,陈光德. 常压化学汽相沉积TiOx纳米光学薄膜及其用于太阳电池减反射膜的研究[J]. 太阳能学报, 2002, 23(4): 437-440 |
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| 作者姓名： | 杨宏 王鹤 于化丛 奚建平 胡宏勋 陈光德 |
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| 作者单位： | 1. 西安交通大学太阳能研究所,西安710049
2. 上海交通大学太阳能研究所,上海200030 |
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| 摘 要： | 报道了用常压化学汽相沉积（APCVD）工艺制备TiOx纳米光学薄膜的研究结果，讨论了衬底温度对薄膜结构及折射率的影响，实验验证了太阳电池对光学减反射膜的理论要求，优化了工艺条件，制备的TiOx纳米光学薄膜性能稳定，大面积颜色均匀一致。采用该工艺制备的TiOx减反射膜能使单晶硅太阳电池光电转换效率平均增加10％。
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| 关 键 词： | 常压化学汽相沉积 光学薄膜 减反射膜 钛氧化合物 太阳能电池 |
| 文章编号： | 0254-0096(2002)04-0437-04 |
| 修稿时间： | 2001-05-22 |
NANOMETER TiOx OPTICAL THIN FILM PREPARED BY APCVD AS ARC FOR SINGLE SILICON SOLAR CELLS |
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| Yang Hong ,Wang He ,Yu Huacong ,Xi Jiangping ,Hu Hongxun ,Chen Guangde. NANOMETER TiOx OPTICAL THIN FILM PREPARED BY APCVD AS ARC FOR SINGLE SILICON SOLAR CELLS[J]. Acta Energiae Solaris Sinica, 2002, 23(4): 437-440 |
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| Authors: | Yang Hong Wang He Yu Huacong Xi Jiangping Hu Hongxun Chen Guangde |
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| Affiliation: | Yang Hong 1,Wang He 1,Yu Huacong 2,Xi Jiangping 2,Hu Hongxun 2,Chen Guangde 1 |
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| Abstract: | This paper reports some investigation results about nanometer TiO x optical thin film prepared by atmospheric pressure chemical vapor deposition(APCVD),the influence of temperature on structure and refractive index of TiO x is discussed.The experiments proved the theroy of antireflection coating(ARC) for silicon solar cell and optimized the process of TiO x ARC for application to commercial silicon photovoltaic cells.The performance of TiO x prepared by this optimal process is steady, and colour of TiO x for large area c Si solar cells is uniform. The optical ARC prepared by this process obtains a 10% average increase of efficiency for large area c Si solar cells. |
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| Keywords: | solar cell atmospheric pressure chemical vapor deposition antireflection coating |
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