| 电子束曝光机工件台控制系统设计 |
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| 引用本文： | 殷伯华,薛虹. 电子束曝光机工件台控制系统设计[J]. 组合机床与自动化加工技术, 2005, 0(2): 64-65 |
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| 作者姓名： | 殷伯华 薛虹 |
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| 作者单位： | 中国科学院电工研究所,北京,100080 |
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| 摘 要： | 文章在比较不同数据传输方式的基础上简述了在电子束曝光过程中上位机曝光软件和下位机工件台控制系统之间的控制指令结构及其传送和转换过程.同时对下位机工件台控制系统的硬件结构和控制软件流程给予了详细介绍.最终实现了电子束分场曝光过程中的工件台移动控制.
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| 关 键 词： | 电子束曝光 工件台控制 单片机 |
| 文章编号： | 1001-2265(2005)02-0064-02 |
| 修稿时间： | 2004-06-28 |
Stage Control System in the E-Beam Lithography System |
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| YIN Bo-hua,XUE Hong. Stage Control System in the E-Beam Lithography System[J]. Modular Machine Tool & Automatic Manufacturing Technique, 2005, 0(2): 64-65 |
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| Authors: | YIN Bo-hua XUE Hong |
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| Abstract: | Based on the comparison of different data transmission methods, the control commands transmission and conversion were discussed in detail. The hardware structure and control software flow chart of stage was presented. The stage moving control was achieved in the step scanning of e-beam lithography. |
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| Keywords: | e-beam lithography system stage control SCM |
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