| 未确认Mura分析及改善对策 |
| |
| 引用本文： | 徐伟,彭毅雯,肖光辉.未确认Mura分析及改善对策[J].液晶与显示,2011,26(5):612-615. |
| |
| 作者姓名： | 徐伟 彭毅雯 肖光辉 |
| |
| 作者单位： | 1. 清华大学电子工程系,北京,100084;北京京东方光电科技有限公司,北京,100176
2. 北京京东方光电科技有限公司,北京,100176 |
| |
| 摘 要： | 未确认Mura是一种能够影响TFT-LCD画面品质的不良。文章对未确认Mura不良进行了详细的分析,认为扇形区域出现有源层残留是导致未确认Mura不良发生的原因,介绍了一种通过变更曝光工艺条件来解决此种不良的方法,并通过试验论证了此方法的量产可行性。
|
| 关 键 词： | 未确认Mura 扇形区域 有源层残留 曝光工艺条件 |
Analysis and Improvement of Unknown Mura |
| |
| XU Wei,PENG Yi-wen,XIAO Guang-hui.Analysis and Improvement of Unknown Mura[J].Chinese Journal of Liquid Crystals and Displays,2011,26(5):612-615. |
| |
| Authors: | XU Wei PENG Yi-wen XIAO Guang-hui |
| |
| Affiliation: | XU Wei1,2,PENG Yi-wen1,XIAO Guang-hui2(1.Department of Electronic Engineering,Tsinghua University,Beijing 100084,China,2.Beijing BOE Optoelectronics Technology Co.Ltd.,Beijing 100176,China) |
| |
| Abstract: | As to the TFT-LCD and other display monitors,Mura is a relatively normal defect which will degrade the display quality greatly.The analysis of the unknown Mura,indicated that the active remain in the Fan-out area are the main reason of the unknown Mura,and a novel method is introduced to solve this defect by changing the condition of Photo process.The mass production feasibility of this method has been demonstrated through experimentation. |
| |
| Keywords: | unknown Mura fan-out area active remain exposure condition |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
