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类金刚石薄膜残余应力的研究进展
引用本文:张婷,何娟,任瑛,邹文俊.类金刚石薄膜残余应力的研究进展[J].材料导报,2016,30(1):84-87, 95.
作者姓名:张婷  何娟  任瑛  邹文俊
作者单位:河南工业大学化学化工学院,郑州,450001
基金项目: 河南省教育厅自然科学项目(15A430004)
摘    要:类金刚石薄膜由于存在很大的残余应力,在实际应用中薄膜易产生裂纹、破裂甚至脱落。这些问题导致类金刚石薄膜在使用过程中过早失效。因此,缓解残余应力是类金刚石薄膜急需解决的问题和实际应用的需要。介绍了类金刚石薄膜残余应力的产生,对国内外调控残余应力的途径以及研究进展进行综述。使用有限元分析法模拟薄膜的残余应力可为类金刚石薄膜的制备和工艺设计提供参考。

关 键 词:DLC薄膜  残余应力  有限元分析法
收稿时间:6/3/2015 12:00:00 AM
修稿时间:2015/9/16 0:00:00

Progresses and perspectives of the residual stress of DLC thin film
ZHANG Ting,HE Juan,REN Ying,ZOU Wenjun.Progresses and perspectives of the residual stress of DLC thin film[J].Materials Review,2016,30(1):84-87, 95.
Authors:ZHANG Ting  HE Juan  REN Ying  ZOU Wenjun
Abstract:The diamond-like carbon (DLC) thin films are liable to crack, fracture and peel off in the application since their high residual stress. These problems could lead to the premature failure in the process of applying DLC thin films. Therefore, relieving residual stress is urgent and of great necessity for DLC thin films in their application. This paper is to introduce the generation of the residual stress of DLC thin films, review the methods of controlling residual stress of DLC thin films as well as the research progress in China and abroad, and provide references for the preparation and structure design of DLC thin films by utilizing the finite element analysis to stimulate the residual stress.
Keywords:DLC thin film  residual stress  finite element analysis
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