Carbon doping and etching in GaxIn1−xAsyP1−y on GaAs substrates using CBr4 by metalorganic chemical vapor deposition

Carbon doping and etching by CBr₄ were studied for Ga_xIn_1−xAs_yP_1−y (0≤y≤1) on GaAs grown by metalorganic chemical vapor deposition. It was found that the hole concentration drastically decreases with decreasing y when the flow rate of CBr₄ is constant. When y is under 0.5, the conduction type of GaInAsP changes ton-type. In the region of 04 was observed during the growth. The rate of etching for InAsP component is about three times larger than that for the GaAsP component. The thermodynamic analysis suggests that the etching is due to the increase of the partial pressure of GaBr and InBr.