Micropatterning of single-walled carbon nanotube forest |
| |
Authors: | A.P. Mousinho R.D. Mansano |
| |
Affiliation: | a Laboratório de Sistemas Integráveis do Departamento de Engenharia de Sistemas, Eletrônicos da Escola Politécnica da Universidade de São Paulo, Av. Prof. Luciano Gualberto, 158, trav. 3, São Paulo, SP, CEP: 05508-010, Brazil |
| |
Abstract: | In this work, high-aligned single-walled carbon nanotube (SWCNT) forest have been grown using a high-density plasma chemical vapor deposition technique (at room temperature) and patterned into micro-structures by photolithographic techniques, that are commonly used for silicon integrated circuit fabrication. The SWCNTs were obtained using pure methane plasma and iron as precursor material (seed). For the growth carbon SWCNT forest the process pressure was 15 mTorr, the RF power was 250 W and the total time of the deposition process was 3 h. The micropatterning processes of the SWCNT forest included conventional photolithography and magnetron sputtering for growing an iron layer (precursor material). In this situation, the iron layer is patterned and high-aligned SWCNTs are grown in the where iron is present, and DLC is formed in the regions where the iron precursor is not present. The results can be proven by Scanning Electronic Microscopy and Raman Spectroscopy. Thus, it is possible to fabricate SWCNT forest-based electronic and optoelectronic devices. |
| |
Keywords: | Carbon nanotubes Nanostructure films Thin films CVD processes Raman Spectroscopy |
本文献已被 ScienceDirect 等数据库收录! |
|