| 炸药沉积蒸发源的结构分析 |
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| 引用本文： | 祝义强,李国新,刘淑珍. 炸药沉积蒸发源的结构分析[J]. 火工品, 1999, 0(3): 11-15 |
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| 作者姓名： | 祝义强 李国新 刘淑珍 |
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| 作者单位： | 北京理工大学,北京,100081 |
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| 摘 要： | 应用真空镀膜技术制作出的爆炸网络其密度比较均匀，膜层的厚度比较容易控制；选择适当的工艺参数，能够制得精度很高的小尺寸产品；蒸发源的结构对镀膜层的均匀性有很大的影响。
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| 关 键 词： | 真空镀膜 蒸发源 爆炸网络 |
| 文章编号： | 1003-1480(1999)03-0011-05 |
| 修稿时间： | 1999-06-20 |
Structural Analysis of the Evaporator Source for Depositing Explosive |
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| ZHU Yi-qiang,LI Guo-xin,LIU Shu-zhen. Structural Analysis of the Evaporator Source for Depositing Explosive[J]. Initiators & Pyrotechnics, 1999, 0(3): 11-15 |
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| Authors: | ZHU Yi-qiang LI Guo-xin LIU Shu-zhen |
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| Abstract: | Making explosive network by vacuum film plating is a new technology, from which explosive network with uniform density and easily controlled thickness can be made. With proper selection of parameters, small dimension products with high precision can be obtained. The structure of evaporator source has great influence on the homogeneity of the film plating. |
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| Keywords: | Vacuum film plating Evaporator source Explosive network |
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