Control of semiconductor manufacturing equipment: real-timefeedback control of a reactive ion etcher |
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| Authors: | Rashap B.A. Elta M.E. Etemad H. Fournier J.P. Freudenberg J.S. Giles M.D. Grizzle J.W. Kabamba P.T. Khargonekar P.P. Lafortune S. Moyne J.R. Teneketzis D. Terry F.L. Jr |
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| Affiliation: | Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI; |
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| Abstract: | This paper describes the development of real-time control technology for the improvement of manufacturing characteristics of reactive ion etchers. A general control strategy is presented. The principal ideas are to sense key plasma parameters, develop a dynamic input-output model for the subsystem connecting the equipment inputs to the key plasma variables, and design and implement a multivariable control system to control these variables. Experimental results show that this approach to closed-loop control leads to a much more stable etch rate in the presence of a variety of disturbances as compared to current industrial practice |
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