SiO_2胶体对磁头表面污染分析

在发生磁头表面污染的清洗工序收集了被污染的样品并提取了水样,将检查后表面无污染的磁头通过清洗用水浸泡准备了模拟样品。用原子力显微镜和超级扫描电子显微镜对两种磁头样品形貌进行观察,结果表明,污染物由20nm左右的纳米微粒组成;采用飞行时间二次离子质谱仪、透射电子显微镜和能量损失谱仪表征了两种样品的污染物成分和微观结构,确定出两种样品污染物同为SiO2;用电感耦合等离子体质谱仪检测污染发生时清洗用水水样,发现Si含量严重超标达到16 600μg/L;在讨论了SiO2在水中存在的形式后,推断出SiO2胶体造成水处理过程中的反渗透膜和离子交换树脂失效,使大量SiO2胶体流入清洗用水造成磁头表面污染。

Analysis of SiO_2 Colloid Contamination on Magnetic Head Surface

The contaminated samples were collected and the water sample was also taken in clea-ning process of contamination occurrence on the magnetic head surface.The simulation samples were prepared up with contamination-free magnetic heads by dipping them into the cleaning water.The atomic force microscopy and super scanning electron microscopy were applied for topo-graphy survey for the two sorts of magnetic head samples.The results show that the contaminant on the magnetic head surface is consisted of the nano-p...