| 镍的金属有机化学气相沉积 |
| |
| 引用本文： | 赵立峰,谢长生.镍的金属有机化学气相沉积[J].材料导报,2002,16(4):52-54. |
| |
| 作者姓名： | 赵立峰 谢长生 |
| |
| 作者单位： | 华中科技大学材料学院,武汉,430074 |
| |
| 摘 要： | 介绍了用MOCVD技术沉积镍膜的应用状况，以及几种典型前驱体的沉积性能，着重介绍了羰基镍的沉积特性。结合MOCVD技术的最新进展，对镍的化学气相沉积技术了简要的展望。
|
| 关 键 词： | 金属有机化学气相沉积 镍薄膜 MOCVD 镍前驱体 羰基镍 |
Matel-organic Chemical Vapor Deposition of Nickel Films |
| |
| ZHAO Lifeng XIE Changsheng.Matel-organic Chemical Vapor Deposition of Nickel Films[J].Materials Review,2002,16(4):52-54. |
| |
| Authors: | ZHAO Lifeng XIE Changsheng |
| |
| Abstract: | Several representative precursors that are used to deposit films of nickel by the chemical technique
are reviewed,with focus on Ni(CO)4.Applications of thin films of nickel are presented in this paper.Based on the latest advances in MOCVD technique,the prospect for nickel film preparation by the chemical vapor deposition technique
is presented. |
| |
| Keywords: | MOCVD films of nickel |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
