Ultrahigh and controllable drain current peak-to-valley ratio innegative resistance field-effect transistors with a strained InGaAschannel |
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Authors: | Jiun-Tsuen Lai Lee J.Y. |
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Affiliation: | Dept. of Electr. Eng., Tsing-Hua Univ., Hsinchu ; |
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Abstract: | Negative resistance field-effect transistor (NERFET) devices using either strained InGaAs or unstrained GaAs channel layers have been fabricated. The strained InGaAs channel NERFET's show strong negative differential resistance and large drain current peak-to-valley ratio. The peak-to-valley ratio of the InGaAs channel NERFET is more than 3000 at room temperature and larger than one million (106) at 77 K. The peak-to-valley ratio is controllable by adjusting the collector voltage |
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